EUV-Resistant Resin

Cat No:ELFM-0237

Description

High-performance photopolymer with exceptional EUV and X-ray radiation resistance, designed for printing precision jigs used in semiconductor lithography.

Datasheet

Inquiry

Basic Information

Material Base	Polyimide / Silica
Primary Function	Lithography Jigs
Volume Resistivity	> 10^16 Ω·cm
Dielectric Constant	3.4 @ 1MHz
Dissipation Factor	0.005
Tensile Strength	82 MPa
Flexural Modulus	3,800 MPa
Elongation @ Break	0.05
Glass Transition (Tg)	280°C
Heat Deflection Temp	245°C
Melting Point	N/A
Density	1.45 g/cm³
Diameter/Form	Liquid
Printing Temp	N/A
Build Plate Temp	N/A
Layer Resolution	0.01mm
Thermal Conductivity	0.45 W/m·K
Shore Hardness	88D
Viscosity	1,150 cps
UV Wavelength	355-405nm
Moisture Absorption	< 0.05%
Surface Finish	Glossy Amber
Print Speed	3.0s / layer
Nozzle Type	N/A
Shelf Life	12 Months

GET IT!

Eata 3DPrint: Your innovation partner for advanced 3D printing solutions, delivering cutting-edge services and materials to transform industries and drive progress.

For Research or Industrial Raw Materials, Not For Personal Medical Use!

Eata 3DPrint: Your innovation partner for advanced 3D printing solutions, delivering cutting-edge services and materials to transform industries and drive progress.

Quick Links

Subscribe to Our Newsletter

Top