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Gallium Oxide (Ga2O3) Sputter Target

Gallium Oxide (Ga2O3) Sputter Target

Gallium Oxide (Ga2O3) Sputter Target

Cat No:PPFM-0154

Description

A wide-bandgap semiconductor raw material used to deposit functional thin films onto 3D printed electronic substrates for high-power applications.

Basic Information

Material State Solid
Color White
Viscosity (cP) N/A
Density (g/cm³) 5.88
Application Method PVD Coating
Curing Mechanism Vacuum Deposition
Surface Tension (mN/m) N/A
Thermal Stability 1900°C
Shore Hardness 6.5 (Mohs)
Contact Angle (Water) N/A
Solubility Insoluble
Flash Point Non-flammable
Shelf Life Indefinite
Storage Temp Room Temp
Tensile Strength 200 MPa
Flexural Modulus 180 GPa
Elongation at Break <1%
Refractive Index 1.9
Electrical Resistance High Bandgap
Moisture Absorption <0.01%
Biocompatibility Industrial
Functional Group Gallium Oxide

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For Research or Industrial Raw Materials, Not For Personal Medical Use!

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