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Yttrium Oxide Sputtering Target

Yttrium Oxide Sputtering Target

Cat No:PPFM-0078

Description

A high-purity rare-earth raw material used to deposit plasma-resistant thin films onto 3D printed ceramic components for semiconductor manufacturing tools.

Basic Information

Material State Solid
Color White
Viscosity (cP) N/A
Density (g/cm³) 5.01
Application Method PVD Coating
Curing Mechanism Vacuum Deposition
Surface Tension (mN/m) N/A
Thermal Stability 2400°C
Shore Hardness 7 (Mohs)
Contact Angle (Water) N/A
Solubility Insoluble
Flash Point Non-flammable
Shelf Life Indefinite
Storage Temp Room Temp
Tensile Strength N/A
Flexural Modulus N/A
Elongation at Break N/A
Refractive Index 1.91
Electrical Resistance Insulator
Moisture Absorption <0.01%
Biocompatibility Biocompatible
Functional Group Rare Earth Oxide

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For Research or Industrial Raw Materials, Not For Personal Medical Use!

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