| Substrate Material | Ta-Cu-Ta |
| Purity (%) | Ta: 5μm (each) |
| Thickness (μm) | 20 (Total) |
| Width (mm) | 100 |
| Areal Density (g/m²) | 190 - 210 |
| Tensile Strength (MPa) | ≥320 |
| Elongation (%) | ≥5.0 |
| Surface Finish | Roll Clad |
| Surface Roughness (Ra, μm) | ≤0.30 |
| Electrical Resistivity (Ω·m) | 1.9 x 10⁻⁸ |
| Thermal Conductivity (W/m·K) | 350 |
| Melting Point (°C) | 1083 (Cu) |
| Oxidation Resistance (Temp/Time) | 400°C / 30min |
| Coating Type | Tantalum Cladding |
| Coating Thickness (μm) | 5 |
| Core ID (mm) | 76 |
| Standard Length (m) | 2 |
| Operating Voltage Range (V) | 0.0 - 6.0 |
| Application Compatibility | Extreme Acid Cells |
| Storage Requirements | Dry / Sealed |
| Form Factor | Roll |
| Hydrophilic Properties | Ultra-Inert |
| Compliance / Grade | Industrial Grade |
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